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A 61300 V concentric cable with two inter-sheaths has a core diameter of 2.3 cm;


dielectric material of 3.3 mm thickness constitutes three zones of insulation.


Determine the maximum stress in each of the three layers, if 21300 V is maintained


across each of the inner two layers.


Connect two conductors to the sheath. Measure the capacitance, Cd between the remaining single conductor and the two other conductors and the sheath. Take the capacitance between the shorted cores and the sheath as Cb. Now determine the effective capacitance of each conductor to the grounded neutral.


Draw an Energy Material Signal Flow for a simple Submarine

1.How can i know the right frequency for operating any ferrite Core transformer that i have winded? 2. Enlighten me as to how to calculate for primary turns and voltage, and secondary turns and voltage.



(5) Threshold voltage of a short channel MOS transistor is smaller than the one of a


long channel MOS as ( ).


A. It occupies smaller area


B. The number of technological processes is small


C. Gate controls smaller number of charge


D. There are piled charges on the boundary of oxide-semiconductor junction


(6) The drain induced barrier lowering happens because of ( ).


A. High gate voltage in an NMOS device


B. High drain voltage that contributes in reducing the threshold voltage


C. The decrease in current in the channel due to high drain voltage


D. All of the above



(1) The minimum subthreshold swing of a MOSFET at T = 350 K is ( ). 

A. 30 mV/decade B. 60 mV/decade C. 70 mV/decade D. 90 mV/decade 

(2) Which of the following causes the drain current to increase with VDS in the 

saturation region? ( ). 

A. channel length modulation B. inversion charge in the channel 

C. the body effect D. mobility degradation 

(3) A MOSFET is biased in the saturation region with a transconductance of gm = 10 

mS in the absence of channel length modulation effects. What would the gm be if 

the CLM parameter was λ = 0.02 V-1 for ΔVDS = 3V? ( ). 

A. 9.94 mS B. 10 mS C. 10.6 mS D. 0.6 mS 

(4) At room temperature, a possible value for the mobility of electrons in the inversion 

layer of a silicon n-channel MOSFET is ( ). 

A. 450 cm2/Vꞏs B. 1350 cm2/Vꞏs C. 1800 cm2/Vꞏs D. 3600 cm2/Vꞏs 




What is the MOSFET short-channel effect, what causes it, and why is it 

undesirable?


Consider a short n-channel MOSFET with Toxe = 2 nm and WT = 35 nm. Suppose 

the threshold voltage (VT) for this device is simply defined to be the value of VGS at 

which the normalized drain current IDS/(W/L) reaches 100 nA for VDS = 100 mV. 

(1) Determine the subthreshold swing, S. 

(2) If the normalized leakage current must be less than or equal to 10 pA when VGS

= 0 V and VDS = 100 mV, what is the minimum threshold voltage this device can 

have? 

(3) Why is a small value of S desirable?


 What is the cause of channel length modulation in a MOSFET?


What is the aspect ratio of channel width to length of n-MOS transistor for the 

following parameters: gm = 1.2 mA/V, VT = 0.5 V, VGS = 2 V, VDS = 1 V, kn = 120 

μA/V2.


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