Answer to Question #73788 in Physical Chemistry for Hattie Mast

Question

To make a thin film of SiO2 in a vacuum chamber, you start with 1.00 mm x 1.00 mm piec of Mo metal as the substrate to build your film on. The first step of the process is to put down a 0.010 mm thick film of Si atoms onto the piece of Mo metal. This Si film has a density of 8.41 x 10^22 atoms/mL. The next step is to oxidize the film with O2 gas. You need two Oxygen atoms for every one silicon atom you have in the film. How many O atoms do you need to make the SiO2 film?

b) This process in only 20. % efficient (meaning 1 atom in 5 react). What is the minimum number of O atoms you need to make the SiO2 film?

c) If there are 1.4 x 10^22 O2 molecules/mL of gas, how many L do you need?